Repeatable Graphene Deposition Below 300 Degrees Celsius
Released
Released
Announcement PDF
Adisyn Ltd | ACN 155 473 304 | 08 6158 9990 | 2 – 3/4 McGrath Road, Henderson WA 6166 | adisyn.com
ASX Announcement
9 June 2026
Repeatable Graphene Deposition Below 300°C
Independent Expert verification by UNSW Sydney Graphene Research Leader opens door to Tier 1
semiconductor engagement and process scale-up
Highlights
• Associate Professor Rakesh Joshi, leader of the Graphene Research Group at University of
NSW Sydney’s School of Materials Science and Engineering, independently verified that
Adisyn has achieved reliable graphene deposition below 300°C
• Three independent experimental runs on separate days, each verified across 10 Raman
Spectroscopy measurement spots highlights process consistency
• Three UHR-TEM cross-sections confirm continuous graphene layer formation across the full
1x1 cm² coupon
• Results have proven a very wide process window temperature range, which makes it much
easier to be adopted by fabs. Process operates well below the semiconductor industry’s
thermal limit, where no previous graphene process deposited on an industrial scale
deposition system has managed to reliably operate
• Milestone 2 confirms successful deposition of an organic substrate capping layer on 1cm2
copper coupons at below 300°C
• The Global Semiconductor Market is forecast to reach approximately US1T by 20301
• Adisyn now moves to engagement with Tier 1 Global Semiconductor Companies, alongside
scale-up to wafer-level formats
Adisyn Ltd (ASX: AI1) (“Adisyn” or “the Company”) is pleased to confirm that it has achieved
Independent Expert verification of the repeatability of its graphene deposition process for next-
generation semiconductors by Associate Professor Rakesh Joshi of UNSW Sydney’s School of Materials
Science and Engineering.
Under the Share Sale and Purchase Agreement (“SPA”) relating to its acquisition of 2D Generation Ltd
(“2DG”) has successfully achieved Milestone 2 which required reliable, repeatable graphene
deposition at temperatures below 300°C2. That bar has now been cleared consistently across multiple
independent experimental runs with results confirming uniformity across the coupon surface.
With this milestone independently verified, Adisyn transitions from R&D proof-of-concept to active
industry engagement and process scale-up.
Program Milestones
• Milestone 1 (achieved - 6 January 2026): Demonstration of continuous graphene formation
on a 1cm² coupon using an industrial ALD system at temperatures below 300°C
1
Kevin Zhang, TSMC, Semiconductor Industry: Present and Future, IEEE solid state Circuit Conference, Feb 2024
2
Refer to ASX announcement dated: 4 November 2024
Adisyn Ltd | ACN 155 473 304 | 08 6158 9990 | 2 – 3/4 McGrath Road, Henderson WA 6166 | adisyn.com
• Milestone 2 (achieved - today): Reliable, repeatable graphene deposition confirmed below
300°C across multiple independent runs, with uniform coverage across the full 1cm2 coupon
• Milestone 3 (next): binding agreement with a global semiconductor corporation and AI1
receiving income of more than AUD1M
Commenting on the milestone, Adisyn Managing Director Arye Kohavi said:
“Achieving Milestone 2 with independent expert verification is a defining moment for Adisyn.
Repeatability is what separates an interesting laboratory result from a process that the semiconductor
industry can actually use. We have now demonstrated that our graphene deposition process works
consistently, run after run, with uniform coverage across the coupon - and we have done so at
temperatures that are fully compatible with existing chip fabrication environments.
This result, combined with our granted US patent3, gives us a strong foundation to begin meaningful
conversations with Tier 1 semiconductor companies. The Company is now positioned to commence
engagement with Tier 1 semiconductor manufacturers.”
The Result: Graphene on Copper, Confirmed Below 300°C
Through its wholly owned subsidiary 2D Generation, Adisyn has demonstrated continuous graphene
film formation on a copper substrate using an industrial Atomic Layer Deposition (ALD) system with
all process steps maintained below 300°C.
The choice of ALD is not incidental. ALD is already one of the standard deposition methods in leading-
edge semiconductor fabs across the world. TSMC, Samsung and Intel all operate ALD systems as core
production infrastructure for their most advanced transistor and interconnect processes.
A chipmaker evaluating Adisyn’s graphene process is anticipated to already have years of experience
running ALD systems and will have detailed understanding of the requirements to implement the new
technology. This understanding breaks down the barriers to adoption and is critical to surpassing
commercial thresholds.
The graphene layer, confirmed at approximately 1-2 nm thickness was verified by two independent
characterisation methods:
• Raman spectroscopy: 10 measurement spots per coupon confirmed consistent graphene
spectral signatures across the full sample surface
• UHR-TEM imaging: cross-section electron microscopy at the Hebrew University of Jerusalem
confirmed a continuous graphene layer with interlayer spacing of 3.4 ± 0.3 Å - consistent with
characteristic graphite structure - and lateral continuity across several micrometres
3
Refer to ASX announcement dated 7 May 2026
Adisyn Ltd | ACN 155 473 304 | 08 6158 9990 | 2 – 3/4 McGrath Road, Henderson WA 6166 | adisyn.com
Figure 1: UHR-TEM cross-section showing the continuous graphene layer (bright band) between the copper substrate and tungsten
protection layer. Scale bar: 5 nm. Hebrew University of Jerusalem.
Figure 2: Close-up UHR-TEM view showing interlayer spacing of 3.4 ± 0.3 Å and 1-2 nm total graphene layer thickness
Repeatability: The Key to Commercial Credibility
Adisyn ran the same deposition recipe (YBPD-391) three times, on separate days. Each run produced
consistent graphene layer formation, confirmed across 10 Raman measurement spots per sample.
The same layer structure appeared every time.
Critically, the layer was also confirmed uniform across the coupon itself. Three separate cross-section
samples taken from different positions across the same 1 cm² coupon produced identical results -
demonstrating that the deposition process covers the substrate evenly, not just in isolated patches.
The results demonstrate repeatability across independent runs and uniformity across the coupon
surface.
Adisyn Ltd | ACN 155 473 304 | 08 6158 9990 | 2 – 3/4 McGrath Road, Henderson WA 6166 | adisyn.com
Figure 3: Three UHR-TEM cross-sections taken at positions 1, 2 and 3 across the same 1x1 cm² coupon (YBPD-391R). The same
continuous graphene layer structure appears at every sampling position, confirming full-coupon uniformity.
Independent Verification: Associate Professor Rakesh Joshi, UNSW Sydney
Associate Professor Rakesh Joshi leads the Graphene Research Group at UNSW Sydney and serves as
Theme Leader for Energy and Environment at the School of Materials Science and Engineering. He is
a Chief Investigator in the ARC Centre of Excellence for Carbon Science and Innovation, has published
over 130 peer-reviewed journal articles in the field, co-authored work with Nobel Laureate Sir Andre
Geim at the University of Manchester, holds five international patents and is a Fellow of the Royal
Society of Chemistry.
Associate Professor Joshi was provided with the full Milestone 2 results dataset, comprising the three-
run Raman repeatability data and UHR-TEM cross-section imaging, and has confirmed the results
meet the Milestone 2 standard.
Milestone outcome and consideration
In accordance with the SPA, and following independent verification and Board approval, the
achievement of Milestone 2 results in the issue of 100 million fully paid ordinary shares to the original
shareholders of 2D Generation.
Additional shares will also be issued to eligible employees under the agreed incentive arrangements,
reflecting their contribution to the delivery of Milestone 2.
What Comes Next: Commercial Engagement and Scale-Up
With Milestone 2 independently confirmed, Adisyn moves into a new phase of its program.
The Company will commence deeper engagement with Tier 1 global semiconductor manufacturers
and fabrication facilities to explore collaboration, validation and integration pathways. The
Adisyn Ltd | ACN 155 473 304 | 08 6158 9990 | 2 – 3/4 McGrath Road, Henderson WA 6166 | adisyn.com
combination of industrial ALD equipment, semiconductor-compatible temperatures and confirmed
repeatable film formation provides the foundation for those conversations.
In parallel, Adisyn will advance film quality optimisation and begin scale-up from 1x1 cm² coupon to
full wafer-level substrates – the format required for commercial semiconductor manufacturing.
The Semiconductor Interconnect Problem
Every advanced chip in every AI server, smartphone and data centre relies on copper interconnects -
the microscopic wiring that links billions of transistors. As chips shrink below 2 nanometres, copper
suffers increased electrical resistance. It generates too much heat, wastes too much power, and limits
how fast signals can travel.
The semiconductor industry has known for years that graphene, with its extraordinary electrical and
thermal properties, is the logical successor material. The problem has been getting graphene to grow
inside a chip fab, using existing equipment, without exceeding the temperature thresholds that would
damage the chip structures already in place.
Adisyn’s process addresses this challenge directly.
This announcement has been approved for release by the Board of Adisyn Ltd.
-ENDS-
Further Information:
Investors Media
Arye Kohavi David Tasker
Managing Director, Adisyn Chapter One Advisors
E: investors@adisyn.com E: dtasker@chapteroneadvisors.com.au
T: 08 6158 9990 T: +61 433 112 936
About Adisyn
Adisyn Ltd (ASX: AI1) is an Australian technology company developing advanced graphene materials
for high-value applications in the semiconductor and advanced materials sectors.
The Company’s core focus is the development of a patented low-temperature Atomic Layer
Deposition (ALD) process designed to enable direct graphene growth on semiconductor wafers,
addressing the performance limitations of copper interconnects in next-generation semiconductor
devices.
Adisyn is also exploring additional commercial applications of its graphene expertise, including
advanced composite materials designed to reduce radar signatures in UAV and defence platforms.
Adisyn’s broader business includes Adisyn Services, which provides managed IT services, cloud,
cybersecurity and artificial intelligence solutions to Australian small and medium-sized enterprises.
Adisyn Ltd | ACN 155 473 304 | 08 6158 9990 | 2 – 3/4 McGrath Road, Henderson WA 6166 | adisyn.com
Forward-looking statements:
Statements contained in this release, particularly those regarding possible or assumed future
performance, revenue, costs, dividends, production levels or rates, prices, or potential growth of
Adisyn Ltd are, or may be, forward-looking statements. Such statements relate to future events and
expectations and as such, involve known and unknown risks and uncertainties. These forward-looking
statements are not guarantees or predictions of future performance and involve known and unknown
risks, uncertainties, and other factors, many of which are beyond the Company’s control, and which
may cause actual results to differ materially from those expressed in the statements contained in this
release.
The Company cautions shareholders and prospective shareholders not to place undue reliance on
forward-looking statements, which reflect the Company’s expectations only as of the date of this
announcement. The Company disclaims any obligation to update or revise any forward-looking
information, whether as a result of new information, future events or otherwise, except as required
by law.
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